• 专利标题: Method of designing semiconductor integrated circuit device and semiconductor integrated circuit device
  • 申请号: US09939699
    申请日: 2001-08-28
  • 公开(公告)号: US06611943B2
    公开(公告)日: 2003-08-26
  • 发明人: Ryuji ShibataShigeru Shimada
  • 申请人: Ryuji ShibataShigeru Shimada
  • 优先权: JP9-224560 19970821; JP9-338337 19971209
  • 主分类号: G06F1750
  • IPC分类号: G06F1750
Method of designing semiconductor integrated circuit device and semiconductor integrated circuit device
摘要:
In a semiconductor integrated circuit device and a method of designing the same, design information about circuit cells each having a desired function are described as objects according to selected purposes. The pieces of design information are registered in a cell library as cell information capable of forming any of substrate potential fixed cells and substrate potential variable cells. Further, a data sheet common to the substrate potential fixed cell and the substrate potential variable cell is offered to a user, so that the user is able to make a selection according to the user's purposes. The substrate potential fixed cells and the substrate potential variable cells are mixed together on a semiconductor chip so as to be properly used according to the functions or the like of circuit portions in which the cells are used.
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