发明授权
- 专利标题： Projection exposure apparatus, and device manufacturing method which compensate for a change in optical performance of a projection optical system
- 专利标题（中）： 投影曝光装置和补偿投影光学系统的光学性能变化的装置制造方法
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申请号： US09658464申请日： 2000-09-08
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公开(公告)号： US06614503B1公开(公告)日： 2003-09-02
- 发明人: Shigeyuki Uzawa
- 申请人： Shigeyuki Uzawa
- 优先权： JP11-255552 19990909
- 主分类号： G03B2752
- IPC分类号： G03B2752
摘要：
A projection exposure apparatus includes a projection optical system with a barrel, a pressure measuring device disposed inside and/or outside the barrel, and a device for estimating a change in pressure in accordance with an output of the pressure measuring device and for compensating for a change in optical performance of the projection optical system due to the change in pressure, in accordance with the estimation.
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