An inorganic insulating film 103 of SiC is formed on a fluorine-containing carbon film 102 by a chemical vapor deposition process using SiF4 and C2H4 as source gases. By using SiF4 and CF4 containing no hydrogen (H) as source gases, H inhibited from being incorporated into the inorganic insulating film 103 forming a hard mask 113. Thus, H having diffused outwardly from the inorganic insulating film 103 is bonded to fluorine (F) in the fluorine-containing carbon film 102 to form HF which inhibits the corrosion of the inorganic insulating film 103 and so forth. Thus, it is possible to inhibit the deterioration of the adhesion of the hard mask 113 formed of the inorganic insulating film 103 to other layers, such as the fluorine-containing carbon film 102.