发明授权
- 专利标题： Polymers, resist compositions and patterning process
- 专利标题（中）： 聚合物，抗蚀剂组合物和图案化工艺
-
申请号： US09870745申请日： 2001-06-01
-
公开(公告)号： US06623909B2公开(公告)日： 2003-09-23
- 发明人: Jun Hatakeyama , Toshiaki Takahashi , Toshinobu Ishihara , Jun Watanabe , Tohru Kubota , Yoshio Kawai
- 申请人： Jun Hatakeyama , Toshiaki Takahashi , Toshinobu Ishihara , Jun Watanabe , Tohru Kubota , Yoshio Kawai
- 优先权： JP2000-165884 20000602; JP2000-165895 20000602
- 主分类号： G03F7038
- IPC分类号： G03F7038
摘要：
Polymers comprising recurring units of formula (1) are provided wherein R1 is a straight, branched or cyclic divalent C1-20 hydrocarbon group or a bridged cyclic hydrocarbon group, R is hydrogen atom or an acid labile group, 0≦m≦3, 0≦n≦3 and 0≦m+n≦6. Using the polymers, chemical amplification positive resist compositions featuring low absorption of F2 excimer laser light are obtained.
公开/授权文献
- US20020012871A1 Polymers, resist compositions and patterning process 公开/授权日：2002-01-31
信息查询
