发明授权
US06625190B1 Semiconductor laser device having thickened impurity-doped aluminum-free optical waveguide layers 失效
具有增厚杂质掺杂的无铝光波导层的半导体激光器件

  • 专利标题: Semiconductor laser device having thickened impurity-doped aluminum-free optical waveguide layers
  • 专利标题(中): 具有增厚杂质掺杂的无铝光波导层的半导体激光器件
  • 申请号: US09648807
    申请日: 2000-08-28
  • 公开(公告)号: US06625190B1
    公开(公告)日: 2003-09-23
  • 发明人: Toshiro HayakawaToshiaki FukunagaMitsugu Wada
  • 申请人: Toshiro HayakawaToshiaki FukunagaMitsugu Wada
  • 优先权: JP11/239119 19990826
  • 主分类号: H01S319
  • IPC分类号: H01S319
Semiconductor laser device having thickened impurity-doped aluminum-free optical waveguide layers
摘要:
In a semiconductor laser device including an active region which is made of an aluminum-free material and a plurality of cladding layers made of at least one AlGaAs or AlGaInP material, the active region includes a quantum well layer and at least one optical waveguide layer; a portion of the at least one optical waveguide layer located on one side of the quantum well layer has a thickness of 0.25 &mgr;m or more; and the at least one optical waveguide layer, other than a portion of the at least one optical waveguide layer being located near the quantum well layer and having a thickness of at least 10 nm, is doped with impurity of 1017 cm−3 or more.
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