发明授权
- 专利标题: Processing chamber
- 专利标题(中): 加工室
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申请号: US09845283申请日: 2001-05-01
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公开(公告)号: US06627038B2公开(公告)日: 2003-09-30
- 发明人: Takashi Nakahara
- 申请人: Takashi Nakahara
- 优先权: JP2000-136117 20000509
- 主分类号: C23F100
- IPC分类号: C23F100
摘要:
A processing chamber is provided which comprises an upper chamber having a stage, a lower chamber which is connectable to and separable from the upper chamber, and an exhaust path, wherein the exhaust path has a separator with an exhaust port which is connectable to and separable from a connector of an exhaust duct, and the separator is configured so as to be able to move together with the lower chamber.
公开/授权文献
- US20010039922A1 Processing chamber 公开/授权日:2001-11-15
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