发明授权
US06627038B2 Processing chamber 失效
加工室

  • 专利标题: Processing chamber
  • 专利标题(中): 加工室
  • 申请号: US09845283
    申请日: 2001-05-01
  • 公开(公告)号: US06627038B2
    公开(公告)日: 2003-09-30
  • 发明人: Takashi Nakahara
  • 申请人: Takashi Nakahara
  • 优先权: JP2000-136117 20000509
  • 主分类号: C23F100
  • IPC分类号: C23F100
Processing chamber
摘要:
A processing chamber is provided which comprises an upper chamber having a stage, a lower chamber which is connectable to and separable from the upper chamber, and an exhaust path, wherein the exhaust path has a separator with an exhaust port which is connectable to and separable from a connector of an exhaust duct, and the separator is configured so as to be able to move together with the lower chamber.
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