发明授权
US06627357B2 Reticle 失效
标线

  • 专利标题: Reticle
  • 专利标题(中): 标线
  • 申请号: US09837721
    申请日: 2001-04-17
  • 公开(公告)号: US06627357B2
    公开(公告)日: 2003-09-30
  • 发明人: Katsuyuki Itoh
  • 申请人: Katsuyuki Itoh
  • 优先权: JP2000-121054 20000417
  • 主分类号: G03F900
  • IPC分类号: G03F900
Reticle
摘要:
A reticle includes a first substrate including a first light-permeable substrate, and a first pattern formed on the first light-permeable substrate and having a first light transmittance, and a second substrate including a second light-permeable substrate, and a second pattern formed on the second light-permeable substrate and having a second light transmittance. The first and second substrates are coupled to each other such that the first and second patterns face each other. A part of the first and second patterns at which the first and second patterns overlap each other defines a light-impermeable pattern.
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