发明授权
- 专利标题: Reticle
- 专利标题(中): 标线
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申请号: US09837721申请日: 2001-04-17
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公开(公告)号: US06627357B2公开(公告)日: 2003-09-30
- 发明人: Katsuyuki Itoh
- 申请人: Katsuyuki Itoh
- 优先权: JP2000-121054 20000417
- 主分类号: G03F900
- IPC分类号: G03F900
摘要:
A reticle includes a first substrate including a first light-permeable substrate, and a first pattern formed on the first light-permeable substrate and having a first light transmittance, and a second substrate including a second light-permeable substrate, and a second pattern formed on the second light-permeable substrate and having a second light transmittance. The first and second substrates are coupled to each other such that the first and second patterns face each other. A part of the first and second patterns at which the first and second patterns overlap each other defines a light-impermeable pattern.
公开/授权文献
- US20010033977A1 Reticle 公开/授权日:2001-10-25
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