发明授权
- 专利标题： Charged-particle-beam mask-based exposure apparatus employing a variable mask-illumination field and alignment and calibration methods therefor
- 专利标题（中）： 采用可变掩模照明场的电荷 - 粒子束掩模型曝光装置及其校准方法
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申请号： US09212975申请日： 1998-12-16
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公开(公告)号： US06627905B1公开(公告)日： 2003-09-30
- 发明人: Noriyuki Hirayanagi
- 申请人： Noriyuki Hirayanagi
- 优先权： JP9-364209 19971216
- 主分类号： H01J37304
- IPC分类号： H01J37304
摘要：
A charged-particle-beam exposure apparatus for exposing mask patterns onto a substrate includes a mask illumination system capable of varying the size and/or shape of the beam cross-section (the irradiated or mask-illumination field) at the mask. Initial mask alignment (rough alignment) and calibration are performed by irradiating respective alignment and calibration marks on the mask with a beam having a cross-sectional size smaller than the cross-sectional size of a beam used in the normal exposure process.
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