- 专利标题： Composition containing a cross-linkable matrix precursor and a poragen, and a porous matrix prepared therefrom
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申请号： US09447011申请日： 1999-11-22
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公开(公告)号： US06630520B1公开(公告)日： 2003-10-07
- 发明人: Kenneth J. Bruza , James P. Godschalx , Edward O. Shaffer, II , Dennis W. Smith, Jr. , Paul H. Townsend, III , Kevin J. Bouck , Qing Shan J. Niu
- 申请人： Kenneth J. Bruza , James P. Godschalx , Edward O. Shaffer, II , Dennis W. Smith, Jr. , Paul H. Townsend, III , Kevin J. Bouck , Qing Shan J. Niu
- 主分类号： C08J902
- IPC分类号： C08J902
摘要：
A suitable cross-linkable matrix precursor and a poragen can be treated to form a porous cross-linked matrix having a Tg of greater than 300° C. The porous matrix material has a lower dielectric constant than the corresponding non-porous matrix material, making the porous matrix material particularly attractive for a variety of electronic applications including integrated circuits, multichip modules, and flat panel display devices.