发明授权
- 专利标题: Planar lightwave circuit platform and method for manufacturing the same
- 专利标题(中): 平面光波电路平台及其制造方法
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申请号: US09595058申请日: 2000-06-16
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公开(公告)号: US06631235B1公开(公告)日: 2003-10-07
- 发明人: Hiroshi Kawashima , Kazutaka Nara , Shiro Nakamura , Kazunori Watanabe
- 申请人: Hiroshi Kawashima , Kazutaka Nara , Shiro Nakamura , Kazunori Watanabe
- 优先权: JP11-171529 19990617
- 主分类号: G02B610
- IPC分类号: G02B610
摘要:
The present invention provides a planar lightwave circuit platform and its method for manufacturing by which the characteristics of the planar lightwave circuit become stable. In a planar lightwave circuit platform comprising quartz-based lower cladding layer (2), height adjusting layer (3), core layer (4), and upper cladding layer (5) formed in order on substrate (1), wherein the glass softening temperature of the height adjusting layer (3) is set to be higher than the glass softening temperatures and the temperatures for transparent-vitrification of the core layer (4) and upper cladding layer (5).
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