发明授权
- 专利标题: Method of producing ferrite thin film
- 专利标题(中): 铁氧体薄膜的制造方法
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申请号: US10102976申请日: 2002-03-22
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公开(公告)号: US06632473B2公开(公告)日: 2003-10-14
- 发明人: Shoji Kaneko , Akio Takayama
- 申请人: Shoji Kaneko , Akio Takayama
- 优先权: JP2001-100927 20010330; JP2002-078779 20020320
- 主分类号: B05D512
- IPC分类号: B05D512
摘要:
A raw material mixed solution containing nitrate or alkoxide of metal that constitutes a ferrite is sprayed from an atomizer by means of a carrier gas such as compressed air onto a substrate mounted on a hot plate and heated to a predetermined temperature. The method enables a thin film having a desired thickness to be formed by a simple apparatus in a short time without sacrificing good soft magnetism of a ferrite, thereby greatly contributing to downsizing and weight reduction of electronic devices.
公开/授权文献
- US20020182324A1 Method of producing ferrite thin film 公开/授权日:2002-12-05
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