Invention Grant
- Patent Title: Method and system for controlling the photolithography process
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Application No.: US10184953Application Date: 2002-07-01
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Publication No.: US06643017B2Publication Date: 2003-11-04
- Inventor: Yoel Cohen , Moshe Finarov
- Applicant: Yoel Cohen , Moshe Finarov
- Priority: IL125338 19980714
- Main IPC: G01J328
- IPC: G01J328

Abstract:
A method and measuring tool are presented for automatic control of photoresist-based processing of a workpiece progressing through a processing tool arrangement. Spectrophotometric measurements are applied to the workpiece prior to being processed, spectral characteristics of the workpiece are measured, thereby obtaining measured data indicative of at least one parameter of the workpiece that defines an optimal value of at least processing time parameter of the processing tool to be used in the processing of said workpiece to obtain certain process results. This data is analyzed to determine data indicative of the optimal value of said at least processing time parameter, and thereby enable calculation of a correction value to be applied to said processing time parameter prior to applying the processing tool to the workpiece.
Public/Granted literature
- US20020171828A1 Method and system for controlling the photolithography process Public/Granted day:2002-11-21
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