发明授权
- 专利标题: Method for producing high purity xylylenediamine
- 专利标题(中): 高纯度苯二甲胺生产方法
-
申请号: US10187020申请日: 2002-07-02
-
公开(公告)号: US06646163B2公开(公告)日: 2003-11-11
- 发明人: Kenichi Nakamura , Kazuhiko Amakawa , Takuji Shitara
- 申请人: Kenichi Nakamura , Kazuhiko Amakawa , Takuji Shitara
- 优先权: JP2001-215006 20010716
- 主分类号: C07C21127
- IPC分类号: C07C21127
摘要:
In a method for producing xylylenediamine by hydrogenating phthalonitrile separated from a gas produced by causing xylene to react with ammonia and oxygen-containing gas in the presence of a catalyst, (1) the gas is brought into contact with an organic solvent to trap phthalonitrile; (2) a liquid in which phthalonitrile is trapped is distilled, to thereby recover phthalonitrile and the organic solvent from the top of the column and separate at the bottom of the column impurities having boiling points higher than that of phthalonitrile; (3) the organic solvent is recovered from the top of the column and liquefied phthalonitrile of high purity is recovered at the bottom of the column; and (4) the phthalonitrile is hydrogenated after mixing with liquid ammonia and at least one solvent selected from aromatic hydrocarbon and saturated hydrocarbon. Thus, high-purity phthalonitrile is produced at high yield industrially efficiently.
公开/授权文献
- US20030013917A1 Method for producing high purity xylylenediamine 公开/授权日:2003-01-16
信息查询