发明授权
US06649079B2 Composition of refrigerant mixtures for low back pressure condition 失效
用于低背压条件的制冷剂混合物的组成

  • 专利标题: Composition of refrigerant mixtures for low back pressure condition
  • 专利标题(中): 用于低背压条件的制冷剂混合物的组成
  • 申请号: US10363249
    申请日: 2003-03-05
  • 公开(公告)号: US06649079B2
    公开(公告)日: 2003-11-18
  • 发明人: Seung-Yon Cho
  • 申请人: Seung-Yon Cho
  • 优先权: KR2000-52675 20000906
  • 主分类号: C09K504
  • IPC分类号: C09K504
Composition of refrigerant mixtures for low back pressure condition
摘要:
There is provided a composition of refrigerant mixtures for low back pressure condition, comprising isobutane, 1,1-difluoroethane and, optionally, additive selected from the group consisting of carbon oxide, trifluoromethyl iodide and mixture thereof. The composition according to the present invention is environment-friendly and can be directly drop in the conventional refrigerator system adopting CFC-12 refrigerant without any systemic change.
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