发明授权
US06649079B2 Composition of refrigerant mixtures for low back pressure condition
失效
用于低背压条件的制冷剂混合物的组成
- 专利标题: Composition of refrigerant mixtures for low back pressure condition
- 专利标题(中): 用于低背压条件的制冷剂混合物的组成
-
申请号: US10363249申请日: 2003-03-05
-
公开(公告)号: US06649079B2公开(公告)日: 2003-11-18
- 发明人: Seung-Yon Cho
- 申请人: Seung-Yon Cho
- 优先权: KR2000-52675 20000906
- 主分类号: C09K504
- IPC分类号: C09K504
摘要:
There is provided a composition of refrigerant mixtures for low back pressure condition, comprising isobutane, 1,1-difluoroethane and, optionally, additive selected from the group consisting of carbon oxide, trifluoromethyl iodide and mixture thereof. The composition according to the present invention is environment-friendly and can be directly drop in the conventional refrigerator system adopting CFC-12 refrigerant without any systemic change.
公开/授权文献
- US20030178597A1 REFRIGERANT MIXTURE FOR LOW BACK PRESSURE CONDITION 公开/授权日:2003-09-25