Invention Grant
US06649859B2 Electron beam irradiation system and electron beam irradiation method 失效
电子束照射系统和电子束照射方法

  • Patent Title: Electron beam irradiation system and electron beam irradiation method
  • Patent Title (中): 电子束照射系统和电子束照射方法
  • Application No.: US10083382
    Application Date: 2002-02-27
  • Publication No.: US06649859B2
    Publication Date: 2003-11-18
  • Inventor: Yoshihisa MiuraYuichi Aki
  • Applicant: Yoshihisa MiuraYuichi Aki
  • Priority: JPP2001-054739 20010228
  • Main IPC: B23K1500
  • IPC: B23K1500
Electron beam irradiation system and electron beam irradiation method
Abstract:
In a partial-vacuum-type, electron-beam irradiation system having a construction such that a static-pressure floating pad is connected to a vacuum chamber incorporating an electron-beam column, and an electron-beam passes through an electron-beam passage of the static-pressure floating pad to impinge on a body to be irradiated in the condition where the static-pressure floating pad is contactlessly attracted to the body to be irradiated, a vacuum-seal valve for opening and closing the electron-beam passage is provided inside the static-pressure floating pad, and when the static-pressure floating pad is separated away from the body to be irradiated, the vacuum-seal valve is actuated to close the electron-beam passage, whereby the atmospheric air is prevented from flowing into the vacuum chamber.
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