Invention Grant
- Patent Title: Electron beam irradiation system and electron beam irradiation method
- Patent Title (中): 电子束照射系统和电子束照射方法
-
Application No.: US10083382Application Date: 2002-02-27
-
Publication No.: US06649859B2Publication Date: 2003-11-18
- Inventor: Yoshihisa Miura , Yuichi Aki
- Applicant: Yoshihisa Miura , Yuichi Aki
- Priority: JPP2001-054739 20010228
- Main IPC: B23K1500
- IPC: B23K1500

Abstract:
In a partial-vacuum-type, electron-beam irradiation system having a construction such that a static-pressure floating pad is connected to a vacuum chamber incorporating an electron-beam column, and an electron-beam passes through an electron-beam passage of the static-pressure floating pad to impinge on a body to be irradiated in the condition where the static-pressure floating pad is contactlessly attracted to the body to be irradiated, a vacuum-seal valve for opening and closing the electron-beam passage is provided inside the static-pressure floating pad, and when the static-pressure floating pad is separated away from the body to be irradiated, the vacuum-seal valve is actuated to close the electron-beam passage, whereby the atmospheric air is prevented from flowing into the vacuum chamber.
Public/Granted literature
- US20020121504A1 Electron beam irradiation system and electron beam irradiation method Public/Granted day:2002-09-05
Information query