A liquid processing apparatus is capable of uniformly processing substrates by a liquid process. The liquid processing apparatus has a chemical liquid tank (21) containing a processing liquid for processing wafers (W) by a predetermined liquid process, a carrying device (24) provided with a wafer holder (42) capable of holding a plurality of wafers (W) to be subjected to the liquid process in a vertical position, and capable of carrying the wafers (W) between a processing position where the wafers (W) are immersed in the chemical liquid contained in the chemical liquid tank (21) and a position above the processing position, and a cover (50) for covering a space extending over the wafers (W) held on the wafer holder (42) of the carrying device (24) so that any air currents may not be substantially generated in the same space.