发明授权
US06660445B2 Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound
有权
包含乙烯基共聚物和邻萘醌二叠氮化合物的感光组合物
- 专利标题: Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound
- 专利标题(中): 包含乙烯基共聚物和邻萘醌二叠氮化合物的感光组合物
-
申请号: US09970988申请日: 2001-10-05
-
公开(公告)号: US06660445B2公开(公告)日: 2003-12-09
- 发明人: Kazuo Fujita , Shiro Tan
- 申请人: Kazuo Fujita , Shiro Tan
- 优先权: JP2000-312929 20001013; JP2001-69062 20010312
- 主分类号: G03F7023
- IPC分类号: G03F7023
摘要:
The present invention relates to a photosensitive compound comprising a vinyl polymer compound which is insoluble in water and soluble in an aqueous alkaline solution and o-naphthoquinonediazide compound, wherein said vinyl polymer compound is a copolymer comprising at least one monomer unit derived from monomer compound (A): a compound having an alkaline-soluble group represented by general formula (I), (II) or (III) as defined in the specification, and at least one monomer unit derived from monomer compound (B): (meth)acrylate having poly(oxyalkylene) chain. A lithographic printing plate prepared from a presensitized plate having a photosensitive layer of said photosensitive compound of the present invention shows improvement of abrasion resistance, printing durability, chemical resistance, development latitude, and contamination property.
公开/授权文献
- US20020068235A1 Photosensitive composition 公开/授权日:2002-06-06
信息查询