- 专利标题： Polymers, resist compositions and patterning process
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申请号： US09947767申请日： 2001-09-07
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公开(公告)号： US06660447B2公开(公告)日： 2003-12-09
- 发明人: Jun Hatakeyama , Yuji Harada , Jun Watanabe , Masaru Sasago , Masayuki Endo , Shinji Kishimura
- 申请人： Jun Hatakeyama , Yuji Harada , Jun Watanabe , Masaru Sasago , Masayuki Endo , Shinji Kishimura
- 优先权： JP2000-271189 20000907
- 主分类号： G03F7004
- IPC分类号： G03F7004
摘要：
A polymer having fluorinated vinyl phenol units copolymerized with acrylonitrile units has high transmittance to VUV radiation. A resist composition using the polymer as a base resin has high sensitivity and resolution to high-energy radiation and good plasma etching resistance and is suited for lithographic microprocessing.
公开/授权文献
- US20020051937A1 Polymers, resist compositions and patterning process 公开/授权日：2002-05-02
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