发明授权
- 专利标题: Method for manufacturing a mechanical conformal grating device
- 专利标题(中): 制造机械保形光栅装置的方法
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申请号: US09867927申请日: 2001-05-30
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公开(公告)号: US06663788B2公开(公告)日: 2003-12-16
- 发明人: Marek W. Kowarz , John A. Lebens
- 申请人: Marek W. Kowarz , John A. Lebens
- 主分类号: C23F100
- IPC分类号: C23F100
摘要:
A method of manufacturing a conformal grating device, that includes the steps of: forming a spacer layer on a substrate; removing portions of the spacer layer to define an active region with at least two channels and at least one intermediate support; forming a sacrificial layer in the active region; forming conductive reflective ribbon elements over the active region; and removing the sacrificial layer from the active region.
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