发明授权
- 专利标题: In-situ probe for optimizing electron beam inspection and metrology based on surface potential
- 专利标题(中): 基于表面电位优化电子束检测和计量的原位探针
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申请号: US09502554申请日: 2000-02-10
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公开(公告)号: US06664546B1公开(公告)日: 2003-12-16
- 发明人: Mark A. McCord , Jan Lauber , Jun Pei , Jorge P. Fernandez
- 申请人: Mark A. McCord , Jan Lauber , Jun Pei , Jorge P. Fernandez
- 主分类号: H01J3721
- IPC分类号: H01J3721
摘要:
Disclosed is a method and apparatus for generating an image from a sample. The apparatus includes a charged particle beam generator arranged to generate and control a charged particle beam substantially towards a portion of the sample and a detector arranged to detect charged particles originating from the sample portion to allow generation of an image from the detected charged particles. The apparatus further includes a measurement device arranged to measure a characteristic of the sample portion to obtain a surface voltage value of the sample portion that is exposed to the charged particle beam. For example, the measurement device is an electrostatic voltmeter positioned to obtain a surface voltage value of the exposed sample portion. A charged particle beam is directed substantially towards a portion of the sample under a first set of operating conditions. A surface charge value of the sample portion is obtained under the first set of operating conditions. It is then determined whether an optimum set of operating conditions associated with a predetermined surface charge value have been found. When the optimum conditions have not been found, the operating conditions are adjusted and the charged particle beam is directed substantially towards the sample portion. When the optimum conditions have been found, the charged particle beam is directed substantially towards the sample portion under the found optimum operating conditions.
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