Invention Grant
US06665046B2 Exposure apparatus and device manufacturing method 失效
曝光装置和装置制造方法

  • Patent Title: Exposure apparatus and device manufacturing method
  • Patent Title (中): 曝光装置和装置制造方法
  • Application No.: US09879912
    Application Date: 2001-06-14
  • Publication No.: US06665046B2
    Publication Date: 2003-12-16
  • Inventor: Hideki NogawaHitoshi Nakano
  • Applicant: Hideki NogawaHitoshi Nakano
  • Priority: JP2000-179590 20000615
  • Main IPC: G03B2752
  • IPC: G03B2752
Exposure apparatus and device manufacturing method
Abstract:
A scan type exposure apparatus for transferring an image of a pattern formed on a mask onto a substrate by synchronously scanning the mask and the substrate in a scanning direction. The apparatus includes a movable stage for holding a substrate thereon, an optical system through which an exposure light path extends, a cover member for encircling the exposure light path, from an end of the optical system toward the stage, and a gas supplying port for discharging an inactive gas into the cover member, wherein the gas is supplied at a predetermined angle with respect to the scan direction.
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