Invention Grant
- Patent Title: Exposure apparatus and device manufacturing method
- Patent Title (中): 曝光装置和装置制造方法
-
Application No.: US09879912Application Date: 2001-06-14
-
Publication No.: US06665046B2Publication Date: 2003-12-16
- Inventor: Hideki Nogawa , Hitoshi Nakano
- Applicant: Hideki Nogawa , Hitoshi Nakano
- Priority: JP2000-179590 20000615
- Main IPC: G03B2752
- IPC: G03B2752

Abstract:
A scan type exposure apparatus for transferring an image of a pattern formed on a mask onto a substrate by synchronously scanning the mask and the substrate in a scanning direction. The apparatus includes a movable stage for holding a substrate thereon, an optical system through which an exposure light path extends, a cover member for encircling the exposure light path, from an end of the optical system toward the stage, and a gas supplying port for discharging an inactive gas into the cover member, wherein the gas is supplied at a predetermined angle with respect to the scan direction.
Public/Granted literature
- US20020018190A1 Exposure apparatus and device manufacturing method Public/Granted day:2002-02-14
Information query