发明授权
US06667250B2 Film substrate treatment apparatus, film substrate treatment method, and film substrate transport method
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薄膜基板处理装置,薄膜基板处理方法以及薄膜基板输送方法
- 专利标题: Film substrate treatment apparatus, film substrate treatment method, and film substrate transport method
- 专利标题(中): 薄膜基板处理装置,薄膜基板处理方法以及薄膜基板输送方法
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申请号: US10403081申请日: 2003-04-01
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公开(公告)号: US06667250B2公开(公告)日: 2003-12-23
- 发明人: Tatsuo Sasaoka , Naoki Suzuki , Takahiro Yonezawa , Satoshi Horie
- 申请人: Tatsuo Sasaoka , Naoki Suzuki , Takahiro Yonezawa , Satoshi Horie
- 优先权: JP2002-099637 20020402
- 主分类号: H01L2131
- IPC分类号: H01L2131
摘要:
To provide a film substrate treatment apparatus that appropriately mounts film substrates on an electrostatic adsorption stage. In the film substrate treatment apparatus, adsorption pads are disposed on the first adsorption units that mount film substrates on an electrostatic stage, and a pressing member that presses the edge portion areas of the film substrates against the stage is provided. The film substrates can thereby be reliably attached to the stage, and the film substrates can be appropriately treated in a decompressed atmosphere.
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