Invention Grant
US06672947B2 Method for global die thinning and polishing of flip-chip packaged integrated circuits 有权
用于倒装芯片封装集成电路的全局模具稀疏和抛光的方法

  • Patent Title: Method for global die thinning and polishing of flip-chip packaged integrated circuits
  • Patent Title (中): 用于倒装芯片封装集成电路的全局模具稀疏和抛光的方法
  • Application No.: US09924736
    Application Date: 2001-08-07
  • Publication No.: US06672947B2
    Publication Date: 2004-01-06
  • Inventor: Chun-Cheng TsaoJohn Valliant
  • Applicant: Chun-Cheng TsaoJohn Valliant
  • Main IPC: B24B100
  • IPC: B24B100
Method for global die thinning and polishing of flip-chip packaged integrated circuits
Abstract:
A reliable, inexpensive “back side” thinning process, capable of globally thinning an integrated circuit die to a target thickness of 10 microns, and maintaining a yield of at least 80%, for chip repair and/or failure analysis of the packaged die. The flip-chip packaged die is exposed at its backside and mounted on a lapping machine with the backside exposed. The thickness of the die is measured at at least five locations on the die. The lapping machine grinds the exposed surface of the die to a thickness somewhat greater than the target thickness. The exposed surface of the die is polished. The thickness of the die is again measured optically with high accuracy. Based on the thickness data collected, appropriate machine operating parameters for further grinding and polishing of the exposed surface are determined. Further grinding and polishing are performed. These steps are repeated until the target thickness is reached.
Information query
Patent Agency Ranking
0/0