发明授权
US06674085B2 Gas-actuated stages including reaction-force-canceling mechanisms for use in charged-particle-beam microlithography systems 有权
气体驱动级包括用于带电粒子束微光刻系统的反作用力消除机构

  • 专利标题: Gas-actuated stages including reaction-force-canceling mechanisms for use in charged-particle-beam microlithography systems
  • 专利标题(中): 气体驱动级包括用于带电粒子束微光刻系统的反作用力消除机构
  • 申请号: US10003357
    申请日: 2001-11-14
  • 公开(公告)号: US06674085B2
    公开(公告)日: 2004-01-06
  • 发明人: Takaharu MiuraKeiichi Tanaka
  • 申请人: Takaharu MiuraKeiichi Tanaka
  • 优先权: JP2000-368668 20001204
  • 主分类号: G05B1100
  • IPC分类号: G05B1100
Gas-actuated stages including reaction-force-canceling mechanisms for use in charged-particle-beam microlithography systems
摘要:
Stage devices are disclosed that include gas-actuation and reaction-force-canceling mechanisms. In an embodiment, an X-axis moving guide extending in the X direction engages a lower stage via a gas bearing. Y-axis sliders (movable elements) are provided at both ends of the X-axis moving guide. A Y-axis fixed guide 8 engages each Y-axis slider via a gas bearing. Each Y-axis slider and respective fixed guide constitute a respective pneumatic actuator. Respective mounting members are provided near the ends of each fixed guide, with interposed gas bearings, and each fixed guide is slidably affixed to a base plate. An actuator for stroke correction is provided in association with each mounting member.
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