发明授权
- 专利标题： Projection exposure methods and apparatus, and projection optical systems
- 专利标题（中）： 投影曝光方法和装置以及投影光学系统
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申请号： US10252427申请日： 2002-09-24
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公开(公告)号： US06674513B2公开(公告)日： 2004-01-06
- 发明人: Yasuhiro Omura
- 申请人： Yasuhiro Omura
- 优先权： JPPCT/JP99/05329 19990929; JPPCT/JP99/06387 19991116
- 主分类号： G03B2754
- IPC分类号： G03B2754
摘要：
A dioptric projection optical system for imaging a reduced image of a pattern on a first surface onto a second surface using radiation-transmitting refractors. The projection optical system has a front lens unit of a positive refracting power and a rear lens unit of a positive refracting power. An aperture stop is located in the vicinity of a rear focal point of the front lens unit.