发明授权
- 专利标题: Temperature measuring method in pattern drawing apparatus
- 专利标题(中): 图案绘图装置中的温度测量方法
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申请号: US09933719申请日: 2001-08-22
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公开(公告)号: US06676289B2公开(公告)日: 2004-01-13
- 发明人: Ryoichi Hirano , Shusuke Yoshitake , Toru Tojo , Shuichiro Fukutome , Teruaki Yamamoto , Masaki Toriumi
- 申请人: Ryoichi Hirano , Shusuke Yoshitake , Toru Tojo , Shuichiro Fukutome , Teruaki Yamamoto , Masaki Toriumi
- 优先权: JP2000-250848 20000822
- 主分类号: G01K1300
- IPC分类号: G01K1300
摘要:
According to one embodiment of the present invention, the present invention may provide a temperature measuring method in a pattern drawing apparatus having a drawing chamber for drawing a pattern on a substrate to be transferred inside, a stage installed inside the drawing chamber, a standby chamber connected to the drawing chamber, and a thermostatic device installed inside the standby chamber, characterized in that a dummy substrate having a temperature measuring device and a recording device for recording the temperature measured by the temperature measuring device is transferred to the thermostatic device, then transferred into the drawing chamber, and then put on the stage, thus the temperature history of the dummy substrate in the transfer route from the thermostatic device to the stage is measured by the temperature measuring device and recorded in the recording device.
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