Invention Grant
- Patent Title: Temperature measuring method in pattern drawing apparatus
- Patent Title (中): 图案绘图装置中的温度测量方法
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Application No.: US09933719Application Date: 2001-08-22
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Publication No.: US06676289B2Publication Date: 2004-01-13
- Inventor: Ryoichi Hirano , Shusuke Yoshitake , Toru Tojo , Shuichiro Fukutome , Teruaki Yamamoto , Masaki Toriumi
- Applicant: Ryoichi Hirano , Shusuke Yoshitake , Toru Tojo , Shuichiro Fukutome , Teruaki Yamamoto , Masaki Toriumi
- Priority: JP2000-250848 20000822
- Main IPC: G01K1300
- IPC: G01K1300

Abstract:
According to one embodiment of the present invention, the present invention may provide a temperature measuring method in a pattern drawing apparatus having a drawing chamber for drawing a pattern on a substrate to be transferred inside, a stage installed inside the drawing chamber, a standby chamber connected to the drawing chamber, and a thermostatic device installed inside the standby chamber, characterized in that a dummy substrate having a temperature measuring device and a recording device for recording the temperature measured by the temperature measuring device is transferred to the thermostatic device, then transferred into the drawing chamber, and then put on the stage, thus the temperature history of the dummy substrate in the transfer route from the thermostatic device to the stage is measured by the temperature measuring device and recorded in the recording device.
Public/Granted literature
- US20020027945A1 Temperature measuring method in pattern drawing apparatus Public/Granted day:2002-03-07
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