Invention Grant
- Patent Title: Low dust wall repair compound
- Patent Title (中): 低灰尘墙修复剂
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Application No.: US09872000Application Date: 2001-06-01
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Publication No.: US06676746B2Publication Date: 2004-01-13
- Inventor: Nathaniel P. Langford
- Applicant: Nathaniel P. Langford
- Main IPC: C04B2402
- IPC: C04B2402

Abstract:
The quantity of dust generated by a sandable wall repair compound is reduced by adding a dust reducing additive to the compound. Dust reducing additives include oil, wax, and mixtures thereof. Dust reducing additives containing oil may include rheological and polar additives to minimize the bleeding of the oil into substrates to which the wall repair compound is applied.
Public/Granted literature
- US20030066456A1 Low dust wall repair compound Public/Granted day:2003-04-10
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