In an electrophotographic process using an amorphous silicon photosensitive member which has a surface protective layer and effecting reverse development and cleaning with a cleaning blade, the surface moving speed PS (mm/sec) of the photosensitive member is 320 mm/sec or more and a film thickness and a specific resistance value of the surface protective layer are respectively Ds (&mgr;m) and Rs (&OHgr;·cm) which fulfill the following conditions: 1.0×109≦Rs≦1.0×1013 Ds≦−0.136Ln(Rs)+(−0.004×PS+6).