发明授权
- 专利标题： Developing solution for photosensitive lithographic printing plate, plate-making method of lithographic printing plate, and photosensitive lithographic printing plate
- 专利标题（中）： 光敏平版印刷版的平版印刷版，平版印刷版的制版方法和光敏平版印刷版
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申请号： US09901676申请日： 2001-07-11
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公开(公告)号： US06686126B2公开(公告)日： 2004-02-03
- 发明人: Mitsumasa Tsuchiya , Hiroyuki Nagase , Shunichi Kondo , Kazuto Kunita
- 申请人： Mitsumasa Tsuchiya , Hiroyuki Nagase , Shunichi Kondo , Kazuto Kunita
- 优先权： JPP2000-214599 20000714; JPP2000-276811 20000912
- 主分类号： G03C730
- IPC分类号： G03C730
摘要：
A plate-making method of a lithographic printing plate is disclosed, which comprises the steps of exposure of a photo-sensitive lithographic printing plate having the acid value of a photosensitive layer of 1.0 meq/g or less with a laser beam, and then development with a developing solution having a pH value of 13.0 or less at a developing speed in an unexposed domain of 0.05 &mgr;m/s or more and at an osmotic speed of a developing solution in an exposed domain of 0.1 &mgr;m/s or less.
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