发明授权
- 专利标题： Laser interferometer displacement measuring system, exposure apparatus, and electron beam lithography apparatus
- 专利标题（中）： 激光干涉仪位移测量系统，曝光设备和电子束光刻设备
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申请号： US09818713申请日： 2001-03-28
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公开(公告)号： US06687013B2公开(公告)日： 2004-02-03
- 发明人: Fumio Isshiki , Masakazu Sugaya , Tatsundo Suzuki , Masahiro Yamaoka , Sumio Hosaka
- 申请人： Fumio Isshiki , Masakazu Sugaya , Tatsundo Suzuki , Masahiro Yamaoka , Sumio Hosaka
- 优先权： JP2000-089556 20000328
- 主分类号： G01B1102
- IPC分类号： G01B1102
摘要：
An absolute accuracy in the range from ±2 nm to ±1 nm for a displacement measurement value is provided by a laser interferometer displacement measuring system. A fluctuating error component that appears corresponding to the wave cycle of laser light is detected and subtracted from the measurement value while a stage is moving, thereby providing a high accuracy.
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