Invention Grant
- Patent Title: Electrode design for stable micro-scale plasma discharges
- Patent Title (中): 电极设计用于稳定的微尺度等离子体放电
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Application No.: US10174234Application Date: 2002-06-18
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Publication No.: US06703784B2Publication Date: 2004-03-09
- Inventor: Paul A. Vonallmen
- Applicant: Paul A. Vonallmen
- Main IPC: H01J724
- IPC: H01J724

Abstract:
A microcavity plasma discharge device comprising a micro-cavity device structure which includes N dielectric material structures wherein N is a whole number greater than or equal to one, each N dielectric material structure including a dielectric spacer region with a first opening wherein the dielectric spacer region is sandwiched therebetween a first dielectric material region with a second opening and a second dielectric material region with a third opening wherein the second opening and the third opening are positioned adjacent to the first opening to form a trench with a width and wherein a first conductive material layer is sandwiched between the dielectric spacer region and the first dielectric material region and a second conductive material layer is sandwiched between the dielectric spacer region and the second dielectric material region.
Public/Granted literature
- US20030230983A1 Electrode design for stable micro-scale plasma discharges Public/Granted day:2003-12-18
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