- 专利标题: Method of inspecting circuit pattern and inspecting instrument
- 专利标题(中): 电路图案检查方法
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申请号: US10430188申请日: 2003-05-07
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公开(公告)号: US06703850B2公开(公告)日: 2004-03-09
- 发明人: Mari Nozoe , Hiroyuki Shinada , Kenji Watanabe , Keiichi Saiki , Aritoshi Sugimoto , Hiroshi Morioka , Maki Tanaka , Hiroshi Miyai
- 申请人: Mari Nozoe , Hiroyuki Shinada , Kenji Watanabe , Keiichi Saiki , Aritoshi Sugimoto , Hiroshi Morioka , Maki Tanaka , Hiroshi Miyai
- 优先权: JP11-122565 19990428
- 主分类号: G01R31305
- IPC分类号: G01R31305
摘要:
In order to obtain optimum irradiation conditions of an electron beam according to the material and structure of a circuit pattern to be inspected and the kind of a failure to be detected and inspect under the optimum conditions without delay of the inspection time, an inspection device for irradiating the electron beam 19 to the sample board 9 which is a sample, detecting generated secondary electrons by the detector 7, storing obtained signals sequentially in the storage, comparing the same pattern stored in the storage by the comparison calculation unit, and extracting a failure by comparing the predetermined threshold value with the comparison signal by the failure decision unit is provided, wherein the optimum value of the irradiation energy is stored in the data base inside the device beforehand according to the structure of a sample and a recommended value of the irradiation energy suited to inspection can be searched for by inputting or selecting the irradiation energy by a user or inputting information regarding the structure of an article to be inspected.