发明授权
- 专利标题: Electron gun and electron beam exposure device
- 专利标题(中): 电子枪和电子束曝光装置
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申请号: US09890959申请日: 2001-09-28
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公开(公告)号: US06707240B1公开(公告)日: 2004-03-16
- 发明人: Mamoru Nakasuji , Kazuya Okamoto
- 申请人: Mamoru Nakasuji , Kazuya Okamoto
- 优先权: JP11-30921 19990209
- 主分类号: H01J115
- IPC分类号: H01J115
摘要:
An electron gun includes a plate-like main cathode 77 having an electron emitting surface 79 and a sub-cathode 81 provided toward the rear surface of the main cathode to heat the main cathode 77 by imparting an electron bombardment. The sub-cathode 81 is constituted of filaments 83 and 85 coiled in a double helix structure and the diameter of the sub-cathode 81 is larger than the diameter of the main cathode 77. As a result, the temperature at the peripheral area of the electron emitting surface 79 can be set higher than the temperature at the center, to achieve an electron beam with a uniform intensity distribution.