Invention Grant
- Patent Title: Flow rate control valve
- Patent Title (中): 流量控制阀
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Application No.: US10193090Application Date: 2002-07-12
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Publication No.: US06708945B2Publication Date: 2004-03-23
- Inventor: Toru Horiuchi , Akio Sato , Kenji Moriyama
- Applicant: Toru Horiuchi , Akio Sato , Kenji Moriyama
- Priority: JP2001-211938 20010712
- Main IPC: F16K3100
- IPC: F16K3100

Abstract:
A flow rate control valve includes a second substrate having a flexible thin film and interposed between a first substrate having a heating mechanism and a third substrate having a sealing section. The first substrate and the second substrate close an internal space formed adjacent to the heating mechanism and filled with an expandable material. The sealing section and the flexible thin film function together as a valve. The heating mechanism heats and expands the expandable material whose pressure is detected by pressure-detecting sensors. The detected pressure value is fed back to a control mechanism of the heating mechanism for opening/closing a fluid flow passage and controlling the valve opening degree.
Public/Granted literature
- US20030010948A1 Flow rate control valve Public/Granted day:2003-01-16
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