发明授权
- 专利标题： Polymers, resist compositions and patterning process
- 专利标题（中）： 聚合物，抗蚀剂组合物和图案化工艺
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申请号： US10068298申请日： 2002-02-08
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公开(公告)号： US06710148B2公开(公告)日： 2004-03-23
- 发明人: Yuji Harada , Jun Hatakeyama , Jun Watanabe , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
- 申请人： Yuji Harada , Jun Hatakeyama , Jun Watanabe , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
- 优先权： JP2001-033262 20010209
- 主分类号： C08F11800
- IPC分类号： C08F11800
摘要：
A copolymer of an acrylate monomer containing fluorine at &agr;-position with a norbornene derivative is highly transparent to VUV radiation and resistant to dry etching. A resist composition using the resin as a base polymer is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, and is suited for lithographic microprocessing.
公开/授权文献
- US20020161148A1 Polymers, resist compositions and patterning process 公开/授权日：2002-10-31