Invention Grant
- Patent Title: Device for measuring gas concentration
- Patent Title (中): 测量气体浓度的装置
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Application No.: US10096227Application Date: 2002-03-12
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Publication No.: US06710347B1Publication Date: 2004-03-23
- Inventor: Gideon Eden
- Applicant: Gideon Eden
- Main IPC: G01J502
- IPC: G01J502

Abstract:
An apparatus and method for detecting at least one component gas in a sample includes a radiation source for providing radiation along an optical path in a pre-selected spectral band having at least one absorption line of the component gas to be detected and an optical detector for detecting radiation at the optical path. A sample chamber is positioned in the optical path between the source and the optical detector to contain a quantity of a sample gas. At least one gas cell enclosing an amount of the gas to be detected is fixedly positioned in the optical path in series with the gas chamber. A mathematical relationship is determined between the detected radiation and the concentration of a sample gas filling the sample chamber.
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