发明授权
- 专利标题: Semiconductor device and process for production thereof
- 专利标题(中): 半导体装置及其制造方法
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申请号: US09881716申请日: 2001-06-18
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公开(公告)号: US06710429B2公开(公告)日: 2004-03-23
- 发明人: Masahiro Saito , Toru Nagamine , Ichio Shimizu
- 申请人: Masahiro Saito , Toru Nagamine , Ichio Shimizu
- 优先权: JP2000-203057 20000630
- 主分类号: H01L23495
- IPC分类号: H01L23495
摘要:
A semiconductor device is provided with outer leads which show themselves in the bottom surface of the resin encapsulated body. This structure eliminates minute chipping and cracking near the resin which has been cut in the vicinity of the end of the outer lead. The semiconductor device is produced in such a way that a push-back-portion is previously arranged between leads of the lead frame and the push-back-portion is pushed down after molding. The resulting semiconductor device has outer leads such that there is no encapsulating resin between outer leads which show themselves in the bottom surface of the resin encapsulated body.
公开/授权文献
- US20020000674A1 Semiconductor device and process for production thereof 公开/授权日:2002-01-03
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