发明授权
- 专利标题: Projection optical system, projection exposure apparatus, and projection exposure method
- 专利标题(中): 投影光学系统,投影曝光装置和投影曝光方法
-
申请号: US10079519申请日: 2002-02-22
-
公开(公告)号: US06714280B2公开(公告)日: 2004-03-30
- 发明人: Yasuhiro Omura
- 申请人: Yasuhiro Omura
- 优先权: JPP2001-049306 20010223; JPP2001-254704 20010824
- 主分类号: G03B2742
- IPC分类号: G03B2742
摘要:
A projection optical system transferring a mask image on a mask onto a substrate and correcting chromatic aberration. A projection exposure system includes at least two refractive optical members collectively containing at least a first fluoride substance and a second fluoride substance, and satisfying the design condition 0.4