发明授权
- 专利标题： Projection optical system, projection exposure apparatus, and projection exposure method
- 专利标题（中）： 投影光学系统，投影曝光装置和投影曝光方法
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申请号： US10079519申请日： 2002-02-22
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公开(公告)号： US06714280B2公开(公告)日： 2004-03-30
- 发明人: Yasuhiro Omura
- 申请人： Yasuhiro Omura
- 优先权： JPP2001-049306 20010223; JPP2001-254704 20010824
- 主分类号： G03B2742
- IPC分类号： G03B2742
摘要：
A projection optical system transferring a mask image on a mask onto a substrate and correcting chromatic aberration. A projection exposure system includes at least two refractive optical members collectively containing at least a first fluoride substance and a second fluoride substance, and satisfying the design condition 0.4