Invention Grant
US06714293B2 Exposure meter 有权
曝光仪

  • Patent Title: Exposure meter
  • Patent Title (中): 曝光仪
  • Application No.: US09948096
    Application Date: 2001-09-07
  • Publication No.: US06714293B2
    Publication Date: 2004-03-30
  • Inventor: Yasushi GotoYoshio Yuasa
  • Applicant: Yasushi GotoYoshio Yuasa
  • Priority: JP2000-280381 20000914; JP2000-280382 20000914
  • Main IPC: G01J142
  • IPC: G01J142
Exposure meter
Abstract:
An exposure meter has both function of an incident light type exposure meter for measuring an exposure value of an object by an incident light to the object and a reflected light type exposure meter for measuring exposure value of the object by a reflected light from the object. A latitude of a film is calculated from the exposure value by the incident light. The exposure value by the incident light and an upper and a lower limit values of the latitude are displayed on a display device. At least one exposure value measured by the reflected light is further displayed on the display device comparably with the latitude.
Public/Granted literature
Information query
Patent Agency Ranking
0/0