Invention Grant
- Patent Title: Exposure meter
- Patent Title (中): 曝光仪
-
Application No.: US09948096Application Date: 2001-09-07
-
Publication No.: US06714293B2Publication Date: 2004-03-30
- Inventor: Yasushi Goto , Yoshio Yuasa
- Applicant: Yasushi Goto , Yoshio Yuasa
- Priority: JP2000-280381 20000914; JP2000-280382 20000914
- Main IPC: G01J142
- IPC: G01J142

Abstract:
An exposure meter has both function of an incident light type exposure meter for measuring an exposure value of an object by an incident light to the object and a reflected light type exposure meter for measuring exposure value of the object by a reflected light from the object. A latitude of a film is calculated from the exposure value by the incident light. The exposure value by the incident light and an upper and a lower limit values of the latitude are displayed on a display device. At least one exposure value measured by the reflected light is further displayed on the display device comparably with the latitude.
Public/Granted literature
- US20020030806A1 Exposure meter Public/Granted day:2002-03-14
Information query