发明授权
- 专利标题： Carrier head for holding a wafer and allowing processing on a front face thereof to occur
- 专利标题（中）： 用于保持晶片并允许其正面进行处理的载体头
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申请号： US10043656申请日： 2002-01-08
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公开(公告)号： US06716084B2公开(公告)日： 2004-04-06
- 发明人: Bulent M. Basol , Cyprian E. Uzoh , Konstantin Volodarsky
- 申请人： Bulent M. Basol , Cyprian E. Uzoh , Konstantin Volodarsky
- 主分类号： B24B100
- IPC分类号： B24B100
摘要：
The present invention uses some type of inflatable membrane during processing to establish a vacuum and/or provide a resilient cushion on which the backside of the wafer can rest. In one aspect, the present invention provides an outer vacuum that allow for attachment of the wafer to the carrier head during processing, and also provides an inner inflatable membrane that provides a resilient cushion on which the backside of the wafer can rest during processing. In other aspects, the present invention provides a membrane that is displaceable with a vacuum within certain cavity regions to provide for attachment of the wafer to the wafer carrier.
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