Invention Grant
- Patent Title: Method and apparatus for measuring nitrogen in a gas
- Patent Title (中): 用于测量气体中的氮的方法和装置
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Application No.: US10098451Application Date: 2002-03-18
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Publication No.: US06717666B2Publication Date: 2004-04-06
- Inventor: Tetsuya Satou , Shang-Qian Wu , Tetsuya Kimijima
- Applicant: Tetsuya Satou , Shang-Qian Wu , Tetsuya Kimijima
- Priority: JP2001-097154 20010329; JP2001-184908 20010619
- Main IPC: G01N2169
- IPC: G01N2169

Abstract:
The present invention provides a method and an apparatus for analyzing nitrogen in a gas, in which the concentration of nitrogen can be continuously measured with good sensitivity without wasting a sample gas. At least one wavelength for measuring a concentration of nitrogen according to the intensity of a light generated by discharge, is selected from a group consisting of 215±2 nm, 226±2 nm, 238±2 nm, 242±2 nm, 246±1 nm, 256±2 nm, 260±2 nm, 266±2 nm, 271±1 nm, 276±4 nm, 285±2 nm, 294±1 nm, and 300±2 nm.
Public/Granted literature
- US20020140932A1 Method and apparatus for measuring nitrogen in a gas Public/Granted day:2002-10-03
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