发明授权
- 专利标题: Step and flash imprint lithography
- 专利标题(中): 步进和闪光刻印光刻
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申请号: US09908765申请日: 2001-07-19
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公开(公告)号: US06719915B2公开(公告)日: 2004-04-13
- 发明人: Carlton Grant Willson , Matthew Earl Colburn
- 申请人: Carlton Grant Willson , Matthew Earl Colburn
- 主分类号: B44C122
- IPC分类号: B44C122
摘要:
A method of forming a relief image in a structure comprising a substrate and a transfer layer formed thereon comprises covering the transfer layer with a polymerizable fluid composition, and then contacting the polymerizable fluid composition with a mold having a relief structure formed therein such that the polymerizable fluid composition fills the relief structure in the mold. The polymerizable fluid composition is subjected to conditions to polymerize polymerizable fluid composition and form a solidified polymeric material therefrom on the transfer layer. The mold is then separated from the solid polymeric material such that a replica of the relief structure in the mold is formed in the solidified polymeric material; and the transfer layer and the solidified polymeric material are subjected to an environment to selectively etch the transfer layer relative to the solidified polymeric material such that a relief image is formed in the transfer layer.
公开/授权文献
- US20010040145A1 Step and flash imprint lithography 公开/授权日:2001-11-15
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