Invention Grant
- Patent Title: Exposure meter used for photographing
- Patent Title (中): 用于拍摄的曝光仪
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Application No.: US10050177Application Date: 2002-01-18
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Publication No.: US06721044B2Publication Date: 2004-04-13
- Inventor: Yasushi Fukazawa , Masaharu Kashima , Ikuo Bunya , Tetsuo Hotta
- Applicant: Yasushi Fukazawa , Masaharu Kashima , Ikuo Bunya , Tetsuo Hotta
- Priority: JP2001-021432 20010130; JP2001-021433 20010130; JP2001-021434 20010130
- Main IPC: G01J142
- IPC: G01J142

Abstract:
An exposure meter for incident- and reflected-light photometry includes an incident-light receiving section, a finder for reflected-light photometry, an arithmetical element for calculating various exposure values on the basis of photometric results obtained by incident- and reflected-light receiving elements, a finder optical system for displaying information on the exposure values obtained by the arithmetical element in the finder, and a display window provided on an exposure meter body. The incident-light receiving section is constructed so that it is can be mounted to or dismounted from the exposure meter body and allows incident-light photometry and lighting setting photometry. The exposure meter further includes a transmitting unit, mountable in or dismountable from the exposure meter body, in which flashlight is emitted and the amount of flashlight can be adjusted in accordance with the information on the exposure values displayed on the display window.
Public/Granted literature
- US20020101582A1 Exposure meter used for photographing Public/Granted day:2002-08-01
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