发明授权
US06722760B2 Ink printing cliché and fabrication method thereof 有权
油墨印刷陈列及其制造方法

  • 专利标题: Ink printing cliché and fabrication method thereof
  • 专利标题(中): 油墨印刷陈列及其制造方法
  • 申请号: US10263202
    申请日: 2002-10-03
  • 公开(公告)号: US06722760B2
    公开(公告)日: 2004-04-20
  • 发明人: Young-Sik JeongMyoung-Kee Baek
  • 申请人: Young-Sik JeongMyoung-Kee Baek
  • 优先权: KR2001-88553 20011229
  • 主分类号: B41J235
  • IPC分类号: B41J235
Ink printing cliché and fabrication method thereof
摘要:
A cliché of a gravure offset printing device is fabricated such that an organic layer and a photoresist layer are formed on a substrate. The photoresist layer is developed to form a photoresist pattern, and in a state that the organic layer is blocked with the photoresist pattern, the organic layer is etched to form a groove. The organic layer allows a fine process, so that a gravure offset printing device adopting the cliché can form a fine ink pattern. This fine pattern produces a resolution that is applicable to the production of semiconductors and liquid crystal display devices.
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