发明授权
US06724460B2 Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
失效
平版印刷设备，设备制造方法，由此制造的设备，清洁单元和清洁被污染物体的方法
- 专利标题： Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
- 专利标题（中）： 平版印刷设备，设备制造方法，由此制造的设备，清洁单元和清洁被污染物体的方法
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申请号： US09988830申请日： 2001-11-19
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公开(公告)号： US06724460B2公开(公告)日： 2004-04-20
- 发明人: Willem Van Schaik , Antonie Ellert Duisterwinkel , Bastiaan Matthias Mertens , Hans Meiling , Norbertus Benedictus Koster
- 申请人： Willem Van Schaik , Antonie Ellert Duisterwinkel , Bastiaan Matthias Mertens , Hans Meiling , Norbertus Benedictus Koster
- 主分类号： G03B2752
- IPC分类号： G03B2752
摘要：
In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.
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