Invention Grant
- Patent Title: Method and device for achieving a high-Q microwave resonant cavity
- Patent Title (中): 实现高Q微波谐振腔的方法和装置
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Application No.: US10036859Application Date: 2001-12-21
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Publication No.: US06727787B2Publication Date: 2004-04-27
- Inventor: Thomas M. Worth , Kaplesh Kumar
- Applicant: Thomas M. Worth , Kaplesh Kumar
- Main IPC: H01P700
- IPC: H01P700

Abstract:
A device for manipulating microwave radiation includes a substrate that defines the shape of a surface for reflecting microwave radiation. The device also includes a metal fitting. The fitting conforms to the defined shape, and provides the surface that reflects microwave radiation.
Public/Granted literature
- US20020113671A1 Method and device for achieving a high-Q microwave resonant cavity Public/Granted day:2002-08-22
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