发明授权
- 专利标题: Applied plasma duct system
- 专利标题(中): 等离子体管道系统
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申请号: US10283358申请日: 2002-10-30
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公开(公告)号: US06729850B2公开(公告)日: 2004-05-04
- 发明人: Raphael A. Dandl , Bill H. Quon , Samuel S Antley , Andrej S. Mitrovic , Wayne L. Johnson
- 申请人: Raphael A. Dandl , Bill H. Quon , Samuel S Antley , Andrej S. Mitrovic , Wayne L. Johnson
- 主分类号: H05H100
- IPC分类号: H05H100
摘要:
A plasma vacuum pump including an array of permanent magnets, one or more plasma conduits or ducts, components for accelerating plasma ions through these conduits, and supporting structures that together comprise at least one applied plasma duct system (APDS) cell. The APDS cell permits large volumes of particles and plasma to flow rapidly in a preferred direction while constricting the flow of neutral particles in the reverse direction. A plasma pump utilizing APDS technology is intended to permit a large throughput of ionized gas at the intermediate pressures of interest in the plasma-enhanced processing industry, compressing this gas to a pressure at which blower-type pumps can be used efficiently to exhaust the spent processing gas at atmospheric pressure.
公开/授权文献
- US20030117080A1 Applied plasma duct system 公开/授权日:2003-06-26
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