发明授权
- 专利标题： Cleaning solution for substrates of electronic materials
- 专利标题（中）： 电子材料基板清洗液
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申请号： US09550152申请日： 2000-04-17
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公开(公告)号： US06730644B1公开(公告)日： 2004-05-04
- 发明人: Norio Ishikawa , Yumiko Abe , Kiyoto Mori
- 申请人： Norio Ishikawa , Yumiko Abe , Kiyoto Mori
- 优先权： JP11-111569 19990420
- 主分类号： C11D102
- IPC分类号： C11D102
摘要：
The present invention relates to a cleaning solution capable of removing efficiently at the same time particles and metallic impurities from a substrate surface without corroding metallic materials. The cleaning solution for cleaning substrates of electronic materials comprises an organic acid compound and at least one selected from the group consisting of dispersants and surfactants.
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